FEI Nova NanoSEM 450
Description
The NanoSEM 450 is a field-emission scanning electron microscope (FE-SEM), which attains ultra-high imaging resolution without the specimen size restrictions of a conventional in-lens FE-SEM due to the advanced design of the electron optics. The NanoSEM 450鈥檚 Schottky field-emission source allows the user to achieve high imaging resolution at a range of kV, at both low (high-resolution imaging) and high (microanalytical imaging) currents. Secondary electron (SE) imaging can be undertaken in both field-free and immersion mode for comprehensive low-to-high resolution imaging of a variety of samples. The NanoSEM 450 is fitted with a retractable annular backscattered electron detector as well as an Oxford silicon drift detector鈥 energy dispersive X-ray spectroscopy (SDD-EDS) system for the convenient visualisation of compositional differences across the specimen surface.聽The instrument is also equipped with a spectral cathodoluminescence (CL) system to allow for point and area analysis of emitted light in the visible through infrared range (~400-1700 nm).
Specifications
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- Schottky field-emission electron gun 50V-30kV operating voltage
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- 1nm at 15kV, 1.4nm at 1kV
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- 2nm at 15kV
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- In lens secondary election detector
- Everhart鈥揟hornley secondary electron detector聽聽
- Annular backscattered electron detector
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- 170 mm2 Oxford X-ray energy dispersive spectroscopy (EDS)
- Delmic SPARC spectral cathodoluminescence system (~400-1700 nm range)
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- SEM pin stub holder
- Cross section holder聽聽
- Wafer holder
Publishing Microscopy Data Acquired on the FEI Nova NanoSEM 450
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- Chemical fixation, dehydration, critical point drying
- Mounting in resin
- Staining
- Polishing
- Mounting on stub with adhesive
- Coating
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- Manufacturer: FEI聽
- Model: Nova NanoSEM 450聽
- Type: Schottky FEG
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- Accelerating voltage (kV)
- Detector(s) used for imaging (SE, BSE, EBSD, SDD-EDX)
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- Detector: Oxford X-Max 170mm2 EDS detector聽
- Software: Oxford AZtec聽
- Accelerating voltage (kV)聽
- For quantitative analysis: matrix correction used, calibration method used (standardless or specify standards), elements calculated via difference or stoichiometry, excluded elements, accuracy of elemental values as shown by measurement of standard(s) of known composition
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- Adjustments to contrast/brightness
- EDS map filters applied
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- Scalebars can be added or removed from images in the export options.
Acknowledgement:
鈥淭he authors acknowledge the facilities and the scientific and technical assistance of Microscopy Australia at the Electron Microscope Unit (EMU) within the Mark Wainwright Analytical Centre (MWAC) at 黑料网大事记 Sydney.鈥
Credit EMU staff:聽Feel free to mention EMU staff who have assisted you with your work! If staff have been involved with your work beyond basic training and support (e.g., project design, complex data/image processing, independent imaging/analysis, manuscript preparation), it may be appropriate to discuss co-authorship with the relevant staff and your supervisor.
Don鈥檛 forget to email the EMU lab manager with a copy of your publication to claim 2 hours of free microscopy time.
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Applications
- Materials Science
- Life sciences
- Biomaterials
- Solar and battery materials
- Earth Sciences
- Medical Sciences
Capabilities
- Secondary electron imaging聽
- Backscatter imaging聽
- Energy dispersive X-ray analysis (EDX)聽
- Cathodoluminescence (CL)
Instrument location
Electron Microscope Unit
B68, Basement
June Griffith Building (F10)
黑料网大事记 Sydney, NSW 2052
Access 鈥 To discuss training or how your project could benefit from using this microscope, please contact the EMU using the or聽 email聽EMUAdmin@unsw.edu.au
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